Request Engineering Review
Engineering Partnerships

Real Optical Challenges. Practical Solutions.

We work alongside engineering teams to understand requirements, coordinate the right optical approach, and deliver components that perform.

Laser Systems OEM Industrial UV Laser Marking

UV Laser Window Optimization for 355nm Industrial System

! The Challenge

A UV laser equipment manufacturer experienced premature optical degradation in 355nm solid-state systems. Output coupling windows showed increasing absorption and color center formation within 1,000 hours, causing >30% power drop. The standard fused silica windows with conventional AR coating were insufficient for the combined UV and power density requirements.

Our Approach

After understanding the failure mode, our engineering team performed root cause analysis identifying two issues: (1) standard-grade fused silica with trace metal impurities causing solarization, and (2) AR coating not optimized for high UV power density. We coordinated a solution: high-purity synthetic fused silica with low metallic impurity, surface quality upgraded from 40-20 to 10-5, and UV-optimized AR coating with LIDT >5 J/cm² at 355nm, 10ns. We also recommended increased substrate thickness for better thermal management.

Results

  • Optical lifetime extended from 1,000 hours to 8,000+ hours
  • Output power fluctuation reduced by 70% over operating lifetime
  • Initial transmission improved by 2.5% (99.7% vs 97.2%)
  • Zero field failures in first 12 months of deployment
Verified Project
Medical Device Manufacturer Diagnostic Imaging System

Precision Imaging Lens Assembly for Diagnostic Instrument

! The Challenge

A medical diagnostic equipment manufacturer needed a custom 3-element imaging lens achieving diffraction-limited MTF across 400-700nm with <0.1% distortion. Tight centration tolerances were required to maintain sensor image quality. Their initial single-vendor approach could not consistently meet MTF specifications across production batches.

Our Approach

Our engineering team collaborated on optical design, recommending an achromatic doublet plus correction element using BK7 and SF11. We optimized the cemented interface for minimum wavefront error and specified centration to 30 arc-seconds. We introduced interferometric incoming inspection for each element before assembly and final assembled-lens MTF verification. Through DFM review, we identified that center thickness tolerances on one element could be relaxed without affecting performance, reducing cost by 15%.

Results

  • MTF exceeded specification across all fields and wavelengths
  • Distortion measured at 0.06% (well under 0.1% target)
  • Batch-to-batch consistency maintained over 20+ production runs
  • 15% cost reduction through DFM tolerance optimization
Verified Project
Semiconductor Equipment OEM Wafer Inspection at 266nm

High-Purity Fused Silica Windows for Wafer Inspection System

! The Challenge

A semiconductor equipment manufacturer developing a 266nm deep-UV wafer inspection system needed optical windows with exceptional wavefront quality (λ/20 at 266nm) and extremely low particulate contamination. The initial supplier could not consistently meet flatness specs and delivered components with unacceptable particle counts.

Our Approach

We understood the contamination and flatness requirements were critical to system performance. We proposed synthetic fused silica (Corning 7980 equivalent) for superior UV transmission and homogeneity, implemented super-polish to achieve λ/20 flatness verified at 266nm, and performed all final cleaning and inspection in partner Class 100 cleanroom facilities. Custom double-container packaging with cleanroom-compatible materials maintained cleanliness through delivery. Each window shipped with a particle count report.

Results

  • Wavefront flatness: λ/22 @ 266nm (exceeds λ/20 spec)
  • Zero out-of-spec particle counts across all delivered batches
  • System signal-to-noise ratio improved by 18% vs. previous windows
  • Consistent performance across 15+ production batches
Verified Project
Research Laboratory Ultrafast Pulse Compression

Custom CaF₂ Prism Pair for Femtosecond Laser System

! The Challenge

A university research lab specializing in ultrafast laser science needed a matched CaF₂ prism pair for pulse compression in a Ti:Sapphire system at 800nm. The prisms required apex angle matching better than 1 arc-minute and exceptionally low wavefront distortion. Standard catalog prisms had too much angle variation between individual pieces.

Our Approach

Understanding the precision required, we coordinated the manufacturing of both prisms in the same batch using identical tooling and process parameters to ensure matching. We applied broadband AR coating at 700-900nm optimized for P-polarization. Final verification included apex angle measurement via autocollimator and transmitted wavefront at 633nm. The matched pair was delivered as a set with comparison data.

Results

  • Apex angle matching: 15 arc-seconds (exceeds 1 arc-min target)
  • Transmitted wavefront: λ/12 @ 633nm per prism
  • Pulse compression achieved: <30 femtoseconds
  • Second identical pair ordered for expanded beam setup
Verified Project
Laser Systems OEM 532nm High-Power CW Laser Marking

High-Power CW Laser Window for Industrial Marking

! The Challenge

An industrial laser marking company operating 2kW CW Nd:YAG systems at 532nm experienced thermal lensing and coating degradation in fused silica windows after only 500 hours, causing frequent replacement and inconsistent marking quality.

Our Approach

After analyzing the thermal failure mechanism, we engineered high-purity synthetic fused silica windows with ultra-low OH content to minimize absorption at 532nm. Each window received dual-side broadband AR coating optimized for 515-545nm with LIDT >40 J/cm². We specified 20-10 surface quality and λ/10 flatness to minimize thermal distortion under continuous operation.

Results

  • Operational lifetime extended to 8,000+ hours (16x improvement)
  • Power fluctuation reduced from 30% to <3% over lifetime
  • Zero coating degradation at 2kW CW operation
  • Annual replacement cost reduced by 85%
Verified Project
Laser Systems OEM 1064nm Laser Cavity

Custom 1064nm High-Reflectivity Mirror for Laser Cavity

! The Challenge

A laser manufacturer building pulsed Nd:YAG systems required HR mirrors with >99.8% reflectivity at 1064nm, damage threshold >10 J/cm², and wavefront distortion <λ/20. Previous supplier could only achieve 99.5% reflectivity with inconsistent damage thresholds.

Our Approach

We coordinated the design of a 35-layer HfO2/SiO2 dielectric coating stack optimized for 1064nm at 0° AOI. Premium fused silica substrates were polished to λ/20 flatness with 20-10 surface quality. Coating deposition used Ion-Assisted Deposition for dense, stable films. Each mirror underwent 100% LIDT testing at 10 J/cm².

Results

  • Reflectivity: 99.85% at 1064nm (exceeds 99.8% spec)
  • LIDT: >12 J/cm² — 20% above requirement
  • Wavefront distortion: λ/25 measured (better than λ/20 spec)
  • Batch consistency: +/-0.02% reflectivity over 5 production runs
Verified Project
Semiconductor Equipment OEM 193nm DUV Wafer Defect Detection

193nm DUV Inspection Lens Assembly for Wafer Defect Detection

! The Challenge

A semiconductor equipment manufacturer developing a 193nm wafer inspection system needed a custom 4-element lens assembly with DUV-grade CaF2 and fused silica. Requirements: <50nm RMS wavefront error, >95% transmission at 193nm, and resistance to solarization under prolonged DUV exposure.

Our Approach

We sourced DUV-grade synthetic fused silica and spectroscopic-grade CaF2 with verified >99% transmission at 193nm. All elements were polished to λ/20 flatness and 10-5 surface quality. AR coatings were optimized for 190-200nm band. Assembly was performed in partner Class 100 cleanroom facilities with precise centering to <10 arc-seconds.

Results

  • Wavefront error: 38nm RMS (within 50nm spec)
  • Assembly transmission: 96.2% at 193nm
  • No measurable solarization after 2000 hours DUV exposure
  • Defect detection resolution improved to 65nm node capability
Verified Project
Medical Device Manufacturer Endoscopic Imaging System

Biocompatible Sapphire Window for Endoscopic Imaging

! The Challenge

A medical device manufacturer developing a reusable endoscope needed a distal window that could withstand repeated autoclave sterilization (134°C, 2 bar), resist scratching from surgical tools, and maintain optical clarity. BK7 and standard glass were failing due to surface damage after 20-30 sterilization cycles.

Our Approach

We identified optical-grade sapphire (Al2O3) as the ideal material — 9H hardness immune to surgical instrument scratching, biocompatible per ISO 10993, and resistant to autoclave sterilization. Each window was polished to λ/4 flatness with broadband AR coating (400-700nm). We achieved the custom 3.5mm diameter with 0.5mm thickness requirement.

Results

  • Survived 500+ autoclave cycles with zero surface degradation
  • No measurable transmission loss after sterilization testing
  • Scratch resistance: no damage from standard surgical tool contact
  • ISO 10993 biocompatibility verified for patient-contact application
Verified Project

Have an Optical Challenge?

Send us your requirement. We will help identify the right approach and coordinate the solution for your application.

Send Your Requirement
Chat with us